HEUSSNER OPTICS, INC.

Old World Service and Craftsmanship

UV Exposure Systems...
Heussner Optics provides many optical of the critical components used in high performance, collimated UV Exposure Systems and UV Lightsources that are used for patterning as well as enhancing many of the photolithographic processes used by the Microelectronics Industry.
These exposure systems are designed for use in production as well as R&D applications. Near, Mid and Deep UV systems are available with a variety of standard and optional features including beam sizes to 16" (400mm), intensity controlling powersupplies, and up to 2,000W capability.

The System's Optics...
Typical exposure optics employ a proven, high performance optic train that employs an elliptical reflector, dielectric heat removing primary and secondary mirrors, a multi-element optical integrator system and collimating optics. The optical integrator system produces non-coherent radiation that virtually eliminates the detrimental effects of diffraction. These high intensity systems can resolve fine structures even in thick resist.

 Features and Options  Typical Applications
  • High Efficiency, Uniform, Lightsource
  • SystemsNear, Mid and Deep UV Versions
  • 200W to 2,000W Systems
  • Intensity Controlling Powersupply Systems
  • Precise Exposure Control
  • Photoresist Patterning
  • Photoresist Stabilization
  • Edge Bead Exposure
  • Image Reversal
  • PCM Processes
Model Ls-100X with Wafer Module

TYPICAL SPECIFICATIONS
   Near UV Systems  Deep UV Systems
 Beam Sizes
 100mm - 400mm
100mm - 200mm
 Beam Divergences
 2.6 deg. - 1.3 deg.
2.6 deg. - 2.3 deg.
 Beam Uniformity
Standard Systems
 Diameters +/- 5%
Squares +/- 6%
Diameters +/- 5%
Squares +/- 6%
 Beam Uniformity
Hi-Uniformity Systems
 Diameters +/- 2.5%
Squares +/- 3.5%
Diameters +/- 2.5%
Squares +/- 3.5%
  Beam Spectrum
  340nm - 450nm
 220nm - 260nm
240nm - 275nm

ARC LAMP POWERSUPPLIES

Heussner Optics offers a complete line of Power Adjustable and Intensity Controlling Hg-Ar, Xe and Xe-Hg Arc Lamp Powersupply Systems for UV Exposure Systems and Mask Aligner Systems.

Power Adjustable, Constant-power Powersupplies provide a +/- 15% power range with better than +/- 0.5% power regulation.

Intensity-controlling Powersupplies include a dual sensor capability for monitoring and controlling the intensity within a specific spectrum. Dual Channel Optical feedback loop provides with better than +/- 2% intensity precision and long term repeatability. These systems incorporate a "Change Lamp" and "Maximum Power Operation" alarm.

500W NUV Powersupply System

1KW DUV Powersupply System

SYSTEM INFO
Power Idle Power  Operating Range 
 200W
 190W
 150W - 250W
 350W
 300W
 200W - 400W
 500W
 450W
 400W - 600W
 1,000W
 925W
 800W - 1,200W
 2,000W
 1,750W
 1,600W - 2,100W

Lenses

 Optical Filters

Beamsplitters

Conical Reflectors

Prisms

  Optical Flats

Collimating Lenses

Compact Arc and Grid Lamps

 UV Mirrors

 UV Exposure Systems

Arc Lamp Powersupplies

Custom Optical Components

For additional technical information and pricing contact us at...
Tel: (408) 988-4214
Fax: (408) 988-2754
Email: info@heussneroptics.com